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One-Step Seedless and Catalyst—Free Growth of Hierarchical ZnO Film Promising for Photoelectrochemical Application
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作者 Jie Wang Lei Pan +3 位作者 Hua Meng Ruqu Han Zhipeng Huang Chi Zhang 《Advances in Materials Physics and Chemistry》 2016年第3期61-76,共16页
A facile one-step method was developed for the fabrication of hierarchical ZnO film on substrate. Neither seed nor catalyst layer is necessary for the growth of hierarchical ZnO film. Three kinds of nucleation process... A facile one-step method was developed for the fabrication of hierarchical ZnO film on substrate. Neither seed nor catalyst layer is necessary for the growth of hierarchical ZnO film. Three kinds of nucleation process were found, and the influences of growth time, growth electrolyte, growth temperature on the morphology of ZnO film were evaluated. Hierarchical ZnO film can absorb more than 97% of incident photons with wavelength shorter than 380 nm. Such hierarchical ZnO film would be a promising scaffold for photoelectrochemical application. 展开更多
关键词 ZNO HIERARCHICAL Solution Growth PHOTOELECTROCHEMICAL Water Splitting
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