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Comparison of electrical characteristic between AlN/GaN and AlGaN/GaN heterostructure Schottky diodes
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作者 吕元杰 冯志红 +5 位作者 林兆军 顾国栋 敦少博 尹甲运 韩婷婷 蔡树军 《Chinese Physics B》 SCIE EI CAS CSCD 2014年第2期421-425,共5页
Ni/Au Schottky contacts on A1N/GaN and A1GaN/GaN heterostructures are fabricated. Based on the measured current-voltage and capacitance-voltage curves, the electrical characteristics of AlN/GaN Schottky diode, such as... Ni/Au Schottky contacts on A1N/GaN and A1GaN/GaN heterostructures are fabricated. Based on the measured current-voltage and capacitance-voltage curves, the electrical characteristics of AlN/GaN Schottky diode, such as Schottky barrier height, turn-on voltage, reverse breakdown voltage, ideal factor, and the current-transport mechanism, are analyzed and then compared with those of an A1GaN/GaN diode by self-consistently solving Schrodinger's and Poisson's equations. It is found that the dislocation-governed tunneling is dominant for both AlN/GaN and AlGaN/GaN Schottky diodes. However, more dislocation defects and a thinner barrier layer for AlN/GaN heterostrncture results in a larger tunneling probability, and causes a larger leakage current and lower reverse breakdown voltage, even though the Schottky barrier height of AlN/GaN Schottky diode is calculated to be higher that of an A1GaN/GaN diode. 展开更多
关键词 Al(Ga)N/GaN Schottky barrier height current-transport mechanism leakage current
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