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A self-biased PLL with low power and compact area 被引量:1
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作者 贾海珑 陈先敏 +1 位作者 刘琦 冯光涛 《Journal of Semiconductors》 EI CAS CSCD 2015年第10期130-134,共5页
A new low power, low phase jitter, compact realization, and sell-biased PLL, which is fabricated on SMIC 40 nm CMOS technology is introduced. The proposed self-biased PLL eliminates extra band gap biasing circuits, an... A new low power, low phase jitter, compact realization, and sell-biased PLL, which is fabricated on SMIC 40 nm CMOS technology is introduced. The proposed self-biased PLL eliminates extra band gap biasing circuits, and internally generates all the biasing voltages and currents. Meanwhile, all of the PLL dynamic loop parameters, such as loop bandwidth, natural frequency, damping factors are kept constant adaptively. By optimizing the circuit structures, the perfect unity of chip estate, power dissipation, phase jitter, and loop stability is achieved. THe PLL consumes 4.2 mW of power tinder 1.1 V/2.5 V voltage supply at 2.4 GHz VCO frequency, while occupying a die area of less than 0.02 mmz (180 × 110 μm2), and the typical period jitter (RMS) is around 2.8 ps. 展开更多
关键词 self-biased PLL ring VCO low power compact area
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Planar split dual gate MOSFET 被引量:1
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作者 XIAO DeYuan CHEN Gary LEE Roger LIU Yung SHEN ChiCheong 《Science in China(Series F)》 2008年第4期440-448,共9页
A new planar split dual gate (PSDG) MOSFET device, its characteristics and experimental results, as well as the three dimensional device simulations, are reported here for the first time. Both theoretical calculatio... A new planar split dual gate (PSDG) MOSFET device, its characteristics and experimental results, as well as the three dimensional device simulations, are reported here for the first time. Both theoretical calculation and 3D simulation, as well as the experiment data, show that the two independent split dual gates can provide dynamical control of the device characteristics, such as threshold voltage (Vt) and sub-threshold swing (SS), as well as the device saturated current. The PSDG MOSFET transistor leakage current (loft) can be reduced as much as 78% of the traditional single gate MOSFET. The PSDG is fabricated and fully compatible with our conventional 0.18 μm logic process flow. 展开更多
关键词 novel device MOSFET planar split dual gate tunable sub-threshold swing
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45nm PCRAM对GST CMP的挑战和解决方法
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作者 Li Jiang Feng Chen +5 位作者 PuLei Zhu Mingqi Li Hongtao Liu Guanping Wu Ming Zhong AoDong He 《功能材料与器件学报》 CAS CSCD 北大核心 2013年第4期183-185,共3页
本文报导GST(Ge2Sb2Te5)CMP工艺的挑战和解决方法。通过适当的抛光垫选择、工艺方案和清洗步骤优化解决GST的污染问题。实现最小氧化物损失的关键因素是抛光液的稀释比例和H2O2浓度的优化和控制过抛光。微微秒激光acoustics型测量工具... 本文报导GST(Ge2Sb2Te5)CMP工艺的挑战和解决方法。通过适当的抛光垫选择、工艺方案和清洗步骤优化解决GST的污染问题。实现最小氧化物损失的关键因素是抛光液的稀释比例和H2O2浓度的优化和控制过抛光。微微秒激光acoustics型测量工具证明适用于GST CMP工艺的在线和离线监控。 展开更多
关键词 PCRAM 稀释比例 磨料 辅料 CMP 抛光垫 GST CMP 过抛光 抛光液 解决方法
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