High power,widely tunable femtosecond MgO:PPLN optical parametric oscillator

We demonstrate a high power,widely tunable femtosecond MgO-doped periodically poled lithium niobate(MgO:PPLN)optical parametric oscillator(OPO)at 151 MHz,pumped by a Kerr-lens mode-locked Yb:KGW laser.With a maximum pump power of 7 W,the OPO is capable of delivering as high as 2.2 W of the signal centered around 1500 nm with tunable signal spectrum ranges of 1377 nm-1730 nm at an extraction efficiency of 31.4%,which exhibits a long-term passive power stability better than 0.71%rms over 4 h.The maximum idler bandwidths of 185 nm at 3613 nm are obtained across the idler tuning ranges of 2539 nm-4191 nm.By compensating intracavity dispersion,the signal has the shortest pulse duration of 170 fs at 1428 nm.

Integration of nanoscale light emitters:an efficient ultraviolet and blue random lasing from NaYF_4:Yb/Tm hexagonal nanocrystals

Near infrared light-controlled release of payloads from ultraviolet-sensitive(UV-sensitive) polymer hydrogels or nanocarriers is one of the most promising strategies for biotherapy. Here, we propose the concept of light activation of NaYF_4:20%Yb, 2%Tm nanocrystals(NCs). NaYF_4:20%Yb, 2%Tm NCs are synthesized by a solvothermal method. Effective upconversion luminescence from NaYF_4:20%Yb, 2%Tm NCs excited by a continuous wave(CW) 980 nm laser is obtained. The NaYF_4:20%Yb, 2%Tm NCs are then used as a laser gain medium and sandwiched between Al and quartz reflectors to form laser microcavities. UV and blue upconverted random lasing is obtained from the laser microcavities. Hence, we verify explicitly that the NaYF_4:Yb, Tm NCs support UV and blue upconversion random lasing via a 980 nm nanosecond laser excitation. Our work provides what we believe is a new concept for precision and localized cancer therapy by external light excitation.

Multilayer dielectric grating pillar-removal damage induced by a picosecond laser

Multilayer dielectric gratings typically remove multiple-grating pillars after picosecond laser irradiation;however,the dynamic formation process of the removal is still unclear.In this study,the damage morphologies of multilayer dielectric gratings induced by an 8.6-ps laser pulse were closely examined.The damage included the removal of a single grating pillar and consecutive adjacent grating pillars and did not involve the destruction of the internal high-reflection mirror structure.Comparative analysis of the two damage morphological characteristics indicated the removal of adjacent pillars was related to an impact process caused by the eruption of localized materials from the left-hand pillar,exerting impact pressure on its adjacent pillars and eventually resulting in multiple pillar removal.A finite-element strain model was used to calculate the stress distribution of the grating after impact.According to the electric field distribution,the eruptive pressure of the dielectric materials after ionization was also simulated.The results suggest that the eruptive pressure resulted in a stress concentration at the root of the adjacent pillar that was sufficient to cause damage,corresponding to the experimental removal of the adjacent pillar from the root.This study provides further understanding of the laser-induced damage behavior of grating pillars and some insights into reducing the undesirable damage process for practical applications.