An analytical model has been developed to study inversion layer quantization in the ultra thin oxide MOS （metal oxide semiconductor） structures using variation and triangular well approaches.Accurate modeling of the...An analytical model has been developed to study inversion layer quantization in the ultra thin oxide MOS （metal oxide semiconductor） structures using variation and triangular well approaches.Accurate modeling of the inversion charge density using the continuous surface potential equations has been done.No approximation has been taken to model the inversion layer quantization process.The results show that the variation approach describes inversion layer quantization process accurately as it matches well with the BSIM 5 （Berkeley short channel insulated gate field effect transistor model 5） results more closely compared with triangular well approach.展开更多
A model has been developed to study the effect of depletion and energy quantization at the poly-silicon /oxide interface on the behavior of a nanometer scale n-MOSFET.A model of inversion charge density,including the ...A model has been developed to study the effect of depletion and energy quantization at the poly-silicon /oxide interface on the behavior of a nanometer scale n-MOSFET.A model of inversion charge density,including the inversion layer quantization using the variation approach in the substrate,has also been produced.Using the exact calculations of the polygate potential under the depletion and quantization conditions,a C-V model has been developed. All the results have been compared with the numerical models reported in existing literature and they show good agreement.展开更多
文摘An analytical model has been developed to study inversion layer quantization in the ultra thin oxide MOS （metal oxide semiconductor） structures using variation and triangular well approaches.Accurate modeling of the inversion charge density using the continuous surface potential equations has been done.No approximation has been taken to model the inversion layer quantization process.The results show that the variation approach describes inversion layer quantization process accurately as it matches well with the BSIM 5 （Berkeley short channel insulated gate field effect transistor model 5） results more closely compared with triangular well approach.
文摘A model has been developed to study the effect of depletion and energy quantization at the poly-silicon /oxide interface on the behavior of a nanometer scale n-MOSFET.A model of inversion charge density,including the inversion layer quantization using the variation approach in the substrate,has also been produced.Using the exact calculations of the polygate potential under the depletion and quantization conditions,a C-V model has been developed. All the results have been compared with the numerical models reported in existing literature and they show good agreement.
