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Novel Silicon Nanotubes
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作者 Hong Bo CHEN Jing Dong LIN +4 位作者 Jun YI Yun CAI Guang WEI Yin Zhong LIN Dai Wei LIAO 《Chinese Chemical Letters》 SCIE CAS CSCD 2001年第12期1139-1140,共2页
Novel silicon nanotubes with inner-diameter of 60-80 nm was prepared using; hydrogen-added dechlorination of SiCl4 followed by chemical vapor deposition (CVD) on a NixMgyO catalyst. The TEM observation showed that the... Novel silicon nanotubes with inner-diameter of 60-80 nm was prepared using; hydrogen-added dechlorination of SiCl4 followed by chemical vapor deposition (CVD) on a NixMgyO catalyst. The TEM observation showed that the suitable reaction temperature is 973 K for the formation of silicon nanotubes. Most of silicon nanotubes have one open end and some have two closed ends. The shape of nanoscale silicon, however, isa micro-crystal type at 873 K, a rod or needle type at 993 K and an onion-type at 1023 K, respectively. 展开更多
关键词 silicon nanotubes chemical vapor deposition chemical etching
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