Si_(1-x)Ge_(x)/Si Single-Mode Rib Waveguides with 0.5 dB/cm by Molecular Beam Epitaxy

Si_(1-x)Ge_(x)/Si single-mode rib waveguides with 0.5dB/cm losses have been fabricated,in which the SiGe layers are grown by molecular beam epitaxy.The single-mode waveguide dimensions determined experimentally are consistent with the single-mode theory of SiGe waveguides.

Charge storage characteristics of Ni nanocrystals formed by synchronous crystallization

The rapid thermal annealing （RTA） nano-crystallization method is widely used in the metal nanocrystal fabrication process. However, the high temperature （usually 600 900 ℃） in the RTA process will worsen the per- formance and reliability of devices. A novel method has been proposed to grow metal nanocrystal by synchronous in situ nano-crystallization of metal thin film （SINC）, which is able to resolve the problems mentioned above. Com- pared with Ni nanocrystals （NCs） formed by RTA, Ni NCs prepared by SINC can obtain more energy to crystallize, and its crystallization temperature is greatly reduced. A large memory window （2.78 V） was observed for Ni NCs deposited by SINC at 300 ℃. However, the largest window is only 1.26 V for Ni NCs formed by RTA at 600 ℃. A large change （from 0.20 to 4.59 V） of the memory window was observed while the operation voltage increased from 0 to 4-10 V, which is due to an occurrence of strong carrier trapping in Ni NCs. Flat-band voltage shift rapidly increases to its saturation value, which indicates that electron/hole trapping in Ni NCs mainly occurs at the initial stage of the program/erase process. A theoretical model was proposed to characterize the charging and discharging processes.

Determination of capacitance-voltage characteristics of organic semiconductor devices by combined current-voltage and voltage decay measurements

We present in this paper a new method,based on measurements of conventional direct current-voltage(I-V) characteristics and transient voltage-time(V-t) characteristics during the discharge process,for determining capacitance-voltage(C-V) characteris-tics of organic semiconductor devices.Derivatives of I-V and V-t,dI/dV and dV/dt,are related with C by a simple formula C=-V(dI/dV)/(dV/dt)The validity of the method is confirmed by experimental data measured from a set of single-organic-layer devices with different layer thicknesses.

Microstructure and optical properties of Ge films prepared by ion beam assisted deposition

Germanium （Ge） films are prepared on BK7 glass and multispectral zinc sulfide （m-ZnS） substrates by ion beam assisted deposition （IBAD）. The effects of substrate temperature, deposition rate, and ion energy on the microstructure and optical properties of the films are investigated. It can be concluded that Ge film deposited with higher rate or ion energy has more optical absorption, while ion energy below 150 eV helps to reduce film absorption. Film refractive index increases with film deposition rate and bombardment ion energy while it is below 300 eV. And higher growth rate or bombardment ion energy can weaken film diffraction intensity.