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DEFECTS AND THEIR THERMAL ANNEALING BEHAVIOURS IN n-Si IMPLANTED WITH BORON AND PHOSPHORUS
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作者 陈建新 李名复 李言谨 《Chinese Physics Letters》 SCIE CAS 1985年第9期401-404,共4页
An up to date most detailed information of H(Hole)as well as E(Electron)traps produced by low dose(10^(11)cm^(-2))boron and phosphorus implantation in n-Si and their thermal annealing behaviours are reported.For the f... An up to date most detailed information of H(Hole)as well as E(Electron)traps produced by low dose(10^(11)cm^(-2))boron and phosphorus implantation in n-Si and their thermal annealing behaviours are reported.For the first time,two hole traps H2(0.62),H3(0.49)of huge concentrations were detected in B^(+)implanted n-Si.They are tentatively assigned as boron related acceptors.H2(0.51)of huge concentration were detected in P^(+)implanted n-Si.Other three hole traps H1(0.63),H4(0.37)and H5(0.15)were detected in both B^(+)and P^(+)implanted n-Si;they are thus unrelated to boron.E traps are also reported;some of these E traps are consistent with previous reports and some are new. 展开更多
关键词 BORON IMPLANTATION ANNEALING
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POLAROGRAPHIC STUDY OF CARBOXYL GROUP OF CARBON BLACKS IN SUSPENDED SOLID SUBSTANCES
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作者 袁倬斌 金剑华 《Chinese Science Bulletin》 SCIE EI CAS 1982年第5期506-510,共5页
Ⅰ. INTRODUCTIONSince the invention of polarography, almost all polarographic studies have been concerned with reactions in true solutions, and there were only a few reports dealing with those in false ones. About fif... Ⅰ. INTRODUCTIONSince the invention of polarography, almost all polarographic studies have been concerned with reactions in true solutions, and there were only a few reports dealing with those in false ones. About fifty years ago, the influence of colloidal solutions upon the electrocapillarity of mercury, and the behavior of colloid particles at a dropping mer- 展开更多
关键词 INVENTION COLLOIDAL dealing concerned fifty false SOLID MERCURY DROPPING TROUGH
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