ZnO thin films were synthesised by a new method which uses polyvinyl alcohol （PVA） as the polymer precursor. The films are annealed at different temperatures and for different annealing times. The structural paramet...ZnO thin films were synthesised by a new method which uses polyvinyl alcohol （PVA） as the polymer precursor. The films are annealed at different temperatures and for different annealing times. The structural parameters, like grain size, lattice constants, optical band gap, and Urbach energy, depend on the annealing temperature and time. All the films possess tensile strain, which relaxes as the annealing temperature and time increase. The photoluminescence （PL） spectra contain only ultraviolet （UV） peaks at low temperature, but as the annealing temperature and time increase, we observe peaks at the blue and green regions with a variation in the intensities of these peaks with annealing temperature and time.展开更多
TiVN films were deposited on Si(100) wafers without external heating and biasing by reactive dc magnetron co-sputtering. Titanium and vanadium metals were used as sputtering targets. Ar and N2 gases were used as sputt...TiVN films were deposited on Si(100) wafers without external heating and biasing by reactive dc magnetron co-sputtering. Titanium and vanadium metals were used as sputtering targets. Ar and N2 gases were used as sputtering gas and reactive gas, respectively. The flow rates of Ar and N2 were 8 and 4 sccm, respectively. The Ti sputtering current (ITi) was kept constant at 0.6 Aand V sputtering current (IV) was varied from 0.4 to1.0 A. The deposition time for all the deposited films was 30 min. The effects of V sputtering current on the structure, surface and cross-sectional morphologies, and chemical composition and chemical state of the films were investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and field emission scanning electron microscopy (FE-SEM), and X-ray photoelectron spectroscopy (XPS), respectively. It was found that all the prepared film formed (Ti,V)N solid solution. The lattice parameter was found to decrease while crystallite size, RMS roughness and film thickness increased with increasing V sputtering current. High resolution XPS spectra of the Ti 2p, V 2p and N 1s revealed that the fraction of Ti-N and V-N bonds increased as the V sputtering current increased. However, the V-N bond was observed only at a high V sputtering current.展开更多
SnSe thin films of thickness 180 nm have been deposited on glass substrates by reactive evaporation at an optimized substrate temperature of 523 ± 5 K and pressure of 10^（-5） mbar.The as-prepared SnSe thin film...SnSe thin films of thickness 180 nm have been deposited on glass substrates by reactive evaporation at an optimized substrate temperature of 523 ± 5 K and pressure of 10^（-5） mbar.The as-prepared SnSe thin films are characterized for their structural,optical and electrical properties by various experimental techniques.The p-type conductivity,near-optimum direct band gap,high absorption coefficient and good photosensitivity of the SnSe thin film indicate its suitability for photovoltaic applications.The optical constants,loss factor,quality factor and optical conductivity of the films are evaluated.The results of Hall and thermoelectric power measurements are correlated to determine the density of states,Fermi energy and effective mass of carriers and are obtained as 2.8×10^（17）cm^（-3）,0.03 eV and 0.05m_0 respectively.The high Seebeck coefficient ≈ 7863 μV/K,reasonably good power factor ≈7.2×10^（-4） W/（m·K^2） and thermoelectric figure of merit ≈1.2 observed at 42 K suggests that,on further work,the prepared SnSe thin films can also be considered as a possible candidate for cryogenic thermoelectric applications.展开更多
Bismuth ferrite（Bi_2Fe_4O_9） thin films were grown on p-type Si（100） substrate by radio-frequency magnetron sputtering at 873 K. X-ray diffraction, field emission scanning electron microscopy and Raman spectroscop...Bismuth ferrite（Bi_2Fe_4O_9） thin films were grown on p-type Si（100） substrate by radio-frequency magnetron sputtering at 873 K. X-ray diffraction, field emission scanning electron microscopy and Raman spectroscopy studies revealed that the grown films have single-phase polycrystalline nature and are crystallized in orthorhombic structure. The grain size of the grown thin films was found to increase（56–130 nm） with sputtering power. Atomic force microscopy images clearly illustrated that the grown thin films have smooth surface. Energy-dispersive X-ray analysis revealed the presence of Bi, Fe and O elements with desired ratio and also the absence of impurities in the grown films. Analysis of ferroelectric hysteresis loops revealed that the remanent polarization and coercive field increase with the increase in sputtering power. Vicker＇s hardness analysis showed that the hardness of films strongly depends on the grain size and film thickness, which are mainly determined by the sputtering power. The above observations revealed that Bi_2Fe_4O_9 thin film deposited at higher sputtering power has good crystallinity and shows better electrical properties.展开更多
文摘ZnO thin films were synthesised by a new method which uses polyvinyl alcohol （PVA） as the polymer precursor. The films are annealed at different temperatures and for different annealing times. The structural parameters, like grain size, lattice constants, optical band gap, and Urbach energy, depend on the annealing temperature and time. All the films possess tensile strain, which relaxes as the annealing temperature and time increase. The photoluminescence （PL） spectra contain only ultraviolet （UV） peaks at low temperature, but as the annealing temperature and time increase, we observe peaks at the blue and green regions with a variation in the intensities of these peaks with annealing temperature and time.
文摘TiVN films were deposited on Si(100) wafers without external heating and biasing by reactive dc magnetron co-sputtering. Titanium and vanadium metals were used as sputtering targets. Ar and N2 gases were used as sputtering gas and reactive gas, respectively. The flow rates of Ar and N2 were 8 and 4 sccm, respectively. The Ti sputtering current (ITi) was kept constant at 0.6 Aand V sputtering current (IV) was varied from 0.4 to1.0 A. The deposition time for all the deposited films was 30 min. The effects of V sputtering current on the structure, surface and cross-sectional morphologies, and chemical composition and chemical state of the films were investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and field emission scanning electron microscopy (FE-SEM), and X-ray photoelectron spectroscopy (XPS), respectively. It was found that all the prepared film formed (Ti,V)N solid solution. The lattice parameter was found to decrease while crystallite size, RMS roughness and film thickness increased with increasing V sputtering current. High resolution XPS spectra of the Ti 2p, V 2p and N 1s revealed that the fraction of Ti-N and V-N bonds increased as the V sputtering current increased. However, the V-N bond was observed only at a high V sputtering current.
基金University Grants Commission (UGC), Government of India for financial assistance in the form of Research Fellowship in Science for Meritorious Students (RFSMS)
文摘SnSe thin films of thickness 180 nm have been deposited on glass substrates by reactive evaporation at an optimized substrate temperature of 523 ± 5 K and pressure of 10^（-5） mbar.The as-prepared SnSe thin films are characterized for their structural,optical and electrical properties by various experimental techniques.The p-type conductivity,near-optimum direct band gap,high absorption coefficient and good photosensitivity of the SnSe thin film indicate its suitability for photovoltaic applications.The optical constants,loss factor,quality factor and optical conductivity of the films are evaluated.The results of Hall and thermoelectric power measurements are correlated to determine the density of states,Fermi energy and effective mass of carriers and are obtained as 2.8×10^（17）cm^（-3）,0.03 eV and 0.05m_0 respectively.The high Seebeck coefficient ≈ 7863 μV/K,reasonably good power factor ≈7.2×10^（-4） W/（m·K^2） and thermoelectric figure of merit ≈1.2 observed at 42 K suggests that,on further work,the prepared SnSe thin films can also be considered as a possible candidate for cryogenic thermoelectric applications.
文摘Bismuth ferrite（Bi_2Fe_4O_9） thin films were grown on p-type Si（100） substrate by radio-frequency magnetron sputtering at 873 K. X-ray diffraction, field emission scanning electron microscopy and Raman spectroscopy studies revealed that the grown films have single-phase polycrystalline nature and are crystallized in orthorhombic structure. The grain size of the grown thin films was found to increase（56–130 nm） with sputtering power. Atomic force microscopy images clearly illustrated that the grown thin films have smooth surface. Energy-dispersive X-ray analysis revealed the presence of Bi, Fe and O elements with desired ratio and also the absence of impurities in the grown films. Analysis of ferroelectric hysteresis loops revealed that the remanent polarization and coercive field increase with the increase in sputtering power. Vicker＇s hardness analysis showed that the hardness of films strongly depends on the grain size and film thickness, which are mainly determined by the sputtering power. The above observations revealed that Bi_2Fe_4O_9 thin film deposited at higher sputtering power has good crystallinity and shows better electrical properties.
