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Improvement of TE-polarized emission in type-Ⅱ InAlN–AlGaN/AlGaN quantum well
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作者 Yi Li Youhua Zhu +2 位作者 Meiyu Wang Honghai Deng Haihong Yin 《Chinese Physics B》 SCIE EI CAS CSCD 2019年第9期343-347,共5页
The optical properties of the type-Ⅱ lineup InxAl1-xN-Al0.59Ga0.41N/Al0.74Ga0.26N quantum well(QW) structures with different In contents are investigated by using the six-by-six K-P method.The type-Ⅱ lineup structur... The optical properties of the type-Ⅱ lineup InxAl1-xN-Al0.59Ga0.41N/Al0.74Ga0.26N quantum well(QW) structures with different In contents are investigated by using the six-by-six K-P method.The type-Ⅱ lineup structures exhibit the larger product of Fermi-Dirac distribution functions of electron fc^n and hole(1-fv^Um) and the approximately equal transverse electric(TE) polarization optical matrix elements(|Mx|^2) for the c1-v1 transition.As a result, the peak intensity in the TE polarization spontaneous emission spectrum is improved by 47.45%-53.84% as compared to that of the conventional AlGaN QW structure.In addition, the type-Ⅱ QW structure with x^0.17 has the largest TE mode peak intensity in the investigated In-content range of 0.13-0.23.It can be attributed to the combined effect of |Mx|^2 and fc^n(1-fv^Um) for the c1-v1, c1-v2, and c1-v3 transitions. 展开更多
关键词 type-Ⅱ LINEUP quantum well K-P method TRANSVERSE electric(TE) polarized emission
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Low-threshold lasing in a plasmonic laser using nanoplate InGaN/GaN 被引量:2
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作者 Ting Zhi Tao Tao +6 位作者 Xiaoyan Liu Junjun Xue Jin Wang Zhikuo Tao Yi Li Zili Xie Bin Liu 《Journal of Semiconductors》 EI CAS CSCD 2021年第12期52-56,共5页
Plasmonic nanolaser as a new type of ultra-small laser,has gain wide interests due to its breaking diffraction limit of light and fast carrier dynamics characters.Normally,the main problem that need to be solved for p... Plasmonic nanolaser as a new type of ultra-small laser,has gain wide interests due to its breaking diffraction limit of light and fast carrier dynamics characters.Normally,the main problem that need to be solved for plasmonic nanolaser is high loss induced by optical and ohmic losses,which leads to the low quality factor.In this work,InGaN/GaN nanoplate plasmonic nanolaser with large interface area were designed and fabricated,where the overlap between SPs and excitons can be enhanced.The lasing threshold is calculated to be~6.36 kW/cm^(2),where the full width at half maximum(FWHM)drops from 27 to 4 nm.And the fast decay time at 502 nm(sharp peak of stimulated lasing)is estimated to be 0.42 ns.Enhanced lasing characters are mainly attributed to the strong confinement of electromagnetic wave in the low refractive index material,which improve the near field coupling between SPs and excitons.Such plasmonic laser should be useful in data storage applications,biological application,light communication,especially for optoelectronic devices integrated into a system on a chip. 展开更多
关键词 surface plasmon plasmonic laser GaN
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